TY - GEN
T1 - Radiation resistance of nanocrystalline silicon carbide
AU - Jamison, Laura
AU - Xu, Peng
AU - Sridharan, Kumar
AU - Allen, Todd
PY - 2011
Y1 - 2011
N2 - Silicon carbide is known for its superior thermomechanical performance, corrosion resistance, and radiation resistance. The radiation resistance of silicon carbide nanopowders with sizes of 10nm and 45nm-55 nm diameter, as well as bulk silicon carbide (grain size ∼ 1μm), have been investigated in situ in the IVEM-Tandem facility at Argonne National Laboratory. The particles were irradiated with 1.0 MeV Kr+ ions over a series of temperatures and doses. The radiation resistance was studied by observing changes in the critical amorphization dose. The 10nm particle size required a lower dose to amorphize at 100°C than either the 45-55nm particles or the bulk silicon carbide. This observation indicates a weakened radiation response with decreasing grain size at temperatures above 100°C Below 100°C no difference in amorphization behavior was observed with changing grain size. Ex situ ion irradiations of thin film nanocrystalline silicon carbide using 2.0 MeV C2+ ions, up to 10 dpa at 600°C showed no evidence of amorphization of the original crystalline structure.
AB - Silicon carbide is known for its superior thermomechanical performance, corrosion resistance, and radiation resistance. The radiation resistance of silicon carbide nanopowders with sizes of 10nm and 45nm-55 nm diameter, as well as bulk silicon carbide (grain size ∼ 1μm), have been investigated in situ in the IVEM-Tandem facility at Argonne National Laboratory. The particles were irradiated with 1.0 MeV Kr+ ions over a series of temperatures and doses. The radiation resistance was studied by observing changes in the critical amorphization dose. The 10nm particle size required a lower dose to amorphize at 100°C than either the 45-55nm particles or the bulk silicon carbide. This observation indicates a weakened radiation response with decreasing grain size at temperatures above 100°C Below 100°C no difference in amorphization behavior was observed with changing grain size. Ex situ ion irradiations of thin film nanocrystalline silicon carbide using 2.0 MeV C2+ ions, up to 10 dpa at 600°C showed no evidence of amorphization of the original crystalline structure.
UR - https://www.scopus.com/pages/publications/79960988430
M3 - Conference contribution
AN - SCOPUS:79960988430
SN - 9781118060001
T3 - Ceramic Transactions
SP - 161
EP - 168
BT - Advances in Materials Science for Environmental and Nuclear Technology II
T2 - Advances in Materials Science for Environmental and Nuclear Technology II - Materials Science and Technology 2010 Conference and Exhibition, MS and T'10
Y2 - 17 October 2010 through 21 October 2010
ER -