Abstract
Preparation of high purity vanadium metal has been investigated by using a combination of silicothermic reduction and fused salt electrorefining processes. The reduction reaction was carried out by heating V 2O 5 / V 20 3 with Si or Si+C mixture, under dynamic vacuum, in the temperature range 1873-1973K. It was possible to prepare vanadium metal, containing 0.03 - 0.08 mass % oxygen, by pyrovacuum treatment alone. Refining of impure vanadium, containing 89.5 mass % vanadium, 4 mass % silicon and 1.3 mass % oxygen, could be accomplished in the LiCl-KCI-VCI2 bath, to a purity of 99.5 mass %.
| Original language | English |
|---|---|
| Pages (from-to) | 237-245 |
| Number of pages | 9 |
| Journal | High Temperature Materials and Processes |
| Volume | 23 |
| Issue number | 4 |
| DOIs | |
| State | Published - 2004 |
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