Microlithographic patterning of polythiophene films

Carl Kutsche; Jim Targove; Peter Haaland

doi:10.1063/1.354077

Microlithographic patterning of polythiophene films

Carl Kutsche
, Jim Targove
, Peter Haaland

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

Lithographic patterning of micrometer scale structures in films of polythiophene, an organic material with good linear and nonlinear χ⁽³⁾ optical properties, has been accomplished by two methods: direct deposition of polythiophene in SiO₂ trenches and an oxygen plasma etch of polythiophene through a spin-on glass mask.

Original language	English
Pages (from-to)	2802-2804
Number of pages	3
Journal	Journal of Applied Physics
Volume	73
Issue number	5
DOIs	https://doi.org/10.1063/1.354077
State	Published - 1993
Externally published	Yes

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10.1063/1.354077

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title = "Microlithographic patterning of polythiophene films",

abstract = "Lithographic patterning of micrometer scale structures in films of polythiophene, an organic material with good linear and nonlinear χ(3) optical properties, has been accomplished by two methods: direct deposition of polythiophene in SiO2 trenches and an oxygen plasma etch of polythiophene through a spin-on glass mask.",

author = "Carl Kutsche and Jim Targove and Peter Haaland",

year = "1993",

doi = "10.1063/1.354077",

language = "English",

volume = "73",

pages = "2802--2804",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

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TY - JOUR

T1 - Microlithographic patterning of polythiophene films

AU - Kutsche, Carl

AU - Targove, Jim

AU - Haaland, Peter

PY - 1993

Y1 - 1993

N2 - Lithographic patterning of micrometer scale structures in films of polythiophene, an organic material with good linear and nonlinear χ(3) optical properties, has been accomplished by two methods: direct deposition of polythiophene in SiO2 trenches and an oxygen plasma etch of polythiophene through a spin-on glass mask.

AB - Lithographic patterning of micrometer scale structures in films of polythiophene, an organic material with good linear and nonlinear χ(3) optical properties, has been accomplished by two methods: direct deposition of polythiophene in SiO2 trenches and an oxygen plasma etch of polythiophene through a spin-on glass mask.

UR - https://www.scopus.com/pages/publications/36449004035

U2 - 10.1063/1.354077

DO - 10.1063/1.354077

M3 - Article

AN - SCOPUS:36449004035

SN - 0021-8979

VL - 73

SP - 2802

EP - 2804

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 5

ER -

Microlithographic patterning of polythiophene films

Abstract

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