Measurement of characteristic wavelengths in modulated microstructures by field‐ion microscopy

M. K. Miller; M. G. Burke; S. S. Brenner

doi:10.1111/j.1365-2818.1985.tb04659.x

Measurement of characteristic wavelengths in modulated microstructures by field‐ion microscopy

M. K. Miller
, M. G. Burke
, S. S. Brenner

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

A procedure to determine the characteristic wavelength of a modulated microstructure from field‐ion micrographs is described. The procedure accounts for the effects of the orientation of the modulations in the specimen and the projection of the curved FIM specimen surface by correlating the measurements from the micrograph with computer simulated micrographs generated with the same orientation. The results exhibit excellent agreement with measurements determined from the spacing of sidebands in electron diffraction patterns. 1985 Blackwell Science Ltd

Original language	English
Pages (from-to)	41-47
Number of pages	7
Journal	Journal of Microscopy
Volume	139
Issue number	1
DOIs	https://doi.org/10.1111/j.1365-2818.1985.tb04659.x
State	Published - Jul 1985
Externally published	Yes

Keywords

FIM
modulation
sideband

Access to Document

10.1111/j.1365-2818.1985.tb04659.x

Cite this

@article{8aeaac1ac1844688a3971fc947238b17,

title = "Measurement of characteristic wavelengths in modulated microstructures by field‐ion microscopy",

abstract = "A procedure to determine the characteristic wavelength of a modulated microstructure from field‐ion micrographs is described. The procedure accounts for the effects of the orientation of the modulations in the specimen and the projection of the curved FIM specimen surface by correlating the measurements from the micrograph with computer simulated micrographs generated with the same orientation. The results exhibit excellent agreement with measurements determined from the spacing of sidebands in electron diffraction patterns. 1985 Blackwell Science Ltd",

keywords = "FIM, modulation, sideband",

author = "Miller, \{M. K.\} and Burke, \{M. G.\} and Brenner, \{S. S.\}",

year = "1985",

month = jul,

doi = "10.1111/j.1365-2818.1985.tb04659.x",

language = "English",

volume = "139",

pages = "41--47",

journal = "Journal of Microscopy",

issn = "0022-2720",

publisher = "Wiley-Blackwell Publishing Ltd",

number = "1",

}

TY - JOUR

T1 - Measurement of characteristic wavelengths in modulated microstructures by field‐ion microscopy

AU - Miller, M. K.

AU - Burke, M. G.

AU - Brenner, S. S.

PY - 1985/7

Y1 - 1985/7

N2 - A procedure to determine the characteristic wavelength of a modulated microstructure from field‐ion micrographs is described. The procedure accounts for the effects of the orientation of the modulations in the specimen and the projection of the curved FIM specimen surface by correlating the measurements from the micrograph with computer simulated micrographs generated with the same orientation. The results exhibit excellent agreement with measurements determined from the spacing of sidebands in electron diffraction patterns. 1985 Blackwell Science Ltd

AB - A procedure to determine the characteristic wavelength of a modulated microstructure from field‐ion micrographs is described. The procedure accounts for the effects of the orientation of the modulations in the specimen and the projection of the curved FIM specimen surface by correlating the measurements from the micrograph with computer simulated micrographs generated with the same orientation. The results exhibit excellent agreement with measurements determined from the spacing of sidebands in electron diffraction patterns. 1985 Blackwell Science Ltd

KW - FIM

KW - modulation

KW - sideband

UR - https://www.scopus.com/pages/publications/84985266519

U2 - 10.1111/j.1365-2818.1985.tb04659.x

DO - 10.1111/j.1365-2818.1985.tb04659.x

M3 - Article

AN - SCOPUS:84985266519

SN - 0022-2720

VL - 139

SP - 41

EP - 47

JO - Journal of Microscopy

JF - Journal of Microscopy

IS - 1

ER -

Measurement of characteristic wavelengths in modulated microstructures by field‐ion microscopy

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this