Formation of thin film of Co- and Ni-silicide by MEVVA implantation

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	192-195
Number of pages	4
Journal	Vide: Science, Technique et Applications
Volume	53
Issue number	283 SUPPL.
State	Published - 1997
Externally published	Yes

Cite this

@article{89254f00bcf34cd498fdaeca17aa9bf9,

title = "Formation of thin film of Co- and Ni-silicide by MEVVA implantation",

author = "Y. Zhang and Whitlow, \{H. J.\} and T. Zhang",

year = "1997",

language = "English",

volume = "53",

pages = "192--195",

journal = "Vide: Science, Technique et Applications",

issn = "1266-0167",

publisher = "Societe Francaise du Vide",

number = "283 SUPPL.",

}

TY - JOUR

T1 - Formation of thin film of Co- and Ni-silicide by MEVVA implantation

AU - Zhang, Y.

AU - Whitlow, H. J.

AU - Zhang, T.

PY - 1997

Y1 - 1997

UR - https://www.scopus.com/pages/publications/20544467716

M3 - Article

AN - SCOPUS:20544467716

SN - 1266-0167

VL - 53

SP - 192

EP - 195

JO - Vide: Science, Technique et Applications

JF - Vide: Science, Technique et Applications

IS - 283 SUPPL.

ER -