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Formation of cobalt silicide from filter metal vacuum arc deposited films
H. J. Whitlow
, Y. Zhang
, C. M. Wang
, D. E. McCready
, T. Zhang
, Y. Wu
Research output
:
Contribution to journal
›
Article
›
peer-review
4
Scopus citations
Overview
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Keyphrases
Deposited Film
100%
CoSi2
100%
Cobalt Silicide
100%
Vacuum Arc
100%
Annealing
66%
CoSi
66%
Transmission Electron Microscopy
33%
Temperature Range
33%
Cobalt
33%
Surface Layer
33%
Annealing Temperature
33%
Amorphous Cobalt Oxide
33%
Si(111)
33%
Depth Distribution
33%
High Current
33%
Oxide Surfaces
33%
Interface Morphology
33%
Chemical Phases
33%
Rutherford Backscattering Spectrometry
33%
Current Filter
33%
Glancing Angle X-ray Diffraction
33%
Co Films
33%
Cusp
33%
Thermal Reaction
33%
Material Science
Silicide
100%
Film
100%
Cobalt
100%
Transmission Electron Microscopy
25%
X-Ray Diffraction
25%
Oxide Surface
25%
Rutherford Backscattering Spectrometry
25%
Engineering
Deposited Film
100%
Cross Section
50%
Temperature Range
50%
Surface Layer
50%
Annealing Temperature
50%
X Ray Diffraction
50%