Effects of Short-Range Attraction in Metal Epitaxial Growth

Jianguo Yu; Jacques G. Amar

doi:10.1103/PhysRevLett.89.286103

Effects of Short-Range Attraction in Metal Epitaxial Growth

Jianguo Yu
, Jacques G. Amar

Nuclear Science & Technology

Research output: Contribution to journal › Article › peer-review

70 Scopus citations

Abstract

The effects of short-range attraction in metal epitaxial growth are studied. Our results indicate that even at normal incidence, the short-range attraction of depositing atoms to step edges can significantly increase the selected mound angle and surface roughness for typical energies used in epitaxial growth. Our results also lead to a picture of the process of deposition near step edges that is quite different from the standard downward funneling picture. Results for the dependence of the uphill current on incident atom kinetic energy and substrate temperature are also presented.

Original language	English
Journal	Physical Review Letters
Volume	89
Issue number	28
DOIs	https://doi.org/10.1103/PhysRevLett.89.286103
State	Published - 2002

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10.1103/PhysRevLett.89.286103

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title = "Effects of Short-Range Attraction in Metal Epitaxial Growth",

abstract = "The effects of short-range attraction in metal epitaxial growth are studied. Our results indicate that even at normal incidence, the short-range attraction of depositing atoms to step edges can significantly increase the selected mound angle and surface roughness for typical energies used in epitaxial growth. Our results also lead to a picture of the process of deposition near step edges that is quite different from the standard downward funneling picture. Results for the dependence of the uphill current on incident atom kinetic energy and substrate temperature are also presented.",

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AB - The effects of short-range attraction in metal epitaxial growth are studied. Our results indicate that even at normal incidence, the short-range attraction of depositing atoms to step edges can significantly increase the selected mound angle and surface roughness for typical energies used in epitaxial growth. Our results also lead to a picture of the process of deposition near step edges that is quite different from the standard downward funneling picture. Results for the dependence of the uphill current on incident atom kinetic energy and substrate temperature are also presented.

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DO - 10.1103/PhysRevLett.89.286103

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SN - 0031-9007

VL - 89

JO - Physical Review Letters

JF - Physical Review Letters

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Effects of Short-Range Attraction in Metal Epitaxial Growth

Abstract

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