Atomic layer deposited boron nitride nanoscale films act as high temperature hydrogen barriers

Engineering & Materials Science

• Boron nitride 100%
• Hydrogen 56%
• Temperature 28%
• Activation energy 18%
• Atomic layer deposition 13%
• Density functional theory 13%
• Substrates 12%
• Vacancies 12%
• Hydrogen embrittlement 11%
• Differential thermal analysis 11%
• Nitrogen 8%
• Propulsion 8%
• Fuel cells 7%
• Coatings 6%
• Gases 5%
• Hot Temperature 4%

Chemical Compounds

• Boron Nitride 80%
• Hydrogen 35%
• Liquid Film 34%
• Diffusion 19%
• Hexagonal Space Group 18%
• Reaction Activation Energy 10%
• Embrittlement 10%
• Atomic Layer Epitaxy 9%
• Differential Thermal Analysis 7%
• Surface 7%
• Fuel 6%
• Resistance 4%
• Density Functional Theory 4%
• Nitrogen 4%
• Coating Agent 4%
• Gas 4%
• Energy 3%

Physics & Astronomy

• boron nitrides 75%
• hydrogen 43%
• activation energy 13%
• hydrogen embrittlement 11%
• fuel cells 10%
• propulsion 9%
• operating temperature 9%
• energy of formation 9%
• atomic layer epitaxy 9%
• thermal analysis 8%
• density functional theory 6%
• nitrogen 6%
• coatings 5%
• gases 4%