7.1: A microsystems enabled field desorption source

Paul J. Resnick; Christopher E. Holland; Paul R. Schwoebel; Kristin L. Hertz; David L. Chichester

doi:10.1109/IVNC.2010.5563205

7.1: A microsystems enabled field desorption source

Paul J. Resnick
, Christopher E. Holland
, Paul R. Schwoebel
, Kristin L. Hertz
, David L. Chichester

Nuclear Nonproliferation

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

Technologies that have been developed for microelectromechanical systems (MEMS) have been applied to the fabrication of field desorption arrays. These techniques include the use of thick films for enhanced dielectric stand-off, as well as an integrated gate electrode. The increased complexity of MEMS fabrication provides enhanced design flexibility over traditional methods.

Original language	English
Title of host publication	23rd International Vacuum Nanoelectronics Conference, IVNC 2010
Pages	104-105
Number of pages	2
DOIs	https://doi.org/10.1109/IVNC.2010.5563205
State	Published - 2010
Event	23rd International Vacuum Nanoelectronics Conference, IVNC 2010 - Palo Alto, CA, United States Duration: Jul 26 2010 → Jul 30 2010

Publication series

Name	23rd International Vacuum Nanoelectronics Conference, IVNC 2010

Conference

Conference	23rd International Vacuum Nanoelectronics Conference, IVNC 2010
Country/Territory	United States
City	Palo Alto, CA
Period	07/26/10 → 07/30/10

Keywords

Arrays
Field desorption
MEMS
Silicon tips

Access to Document

10.1109/IVNC.2010.5563205

Cite this

@inproceedings{9ad60c67f3db48bd9568be136b84fd9f,

title = "7.1: A microsystems enabled field desorption source",

abstract = "Technologies that have been developed for microelectromechanical systems (MEMS) have been applied to the fabrication of field desorption arrays. These techniques include the use of thick films for enhanced dielectric stand-off, as well as an integrated gate electrode. The increased complexity of MEMS fabrication provides enhanced design flexibility over traditional methods.",

keywords = "Arrays, Field desorption, MEMS, Silicon tips",

author = "Resnick, \{Paul J.\} and Holland, \{Christopher E.\} and Schwoebel, \{Paul R.\} and Hertz, \{Kristin L.\} and Chichester, \{David L.\}",

year = "2010",

doi = "10.1109/IVNC.2010.5563205",

language = "English",

isbn = "9781424478873",

series = "23rd International Vacuum Nanoelectronics Conference, IVNC 2010",

pages = "104--105",

booktitle = "23rd International Vacuum Nanoelectronics Conference, IVNC 2010",

note = "23rd International Vacuum Nanoelectronics Conference, IVNC 2010 ; Conference date: 26-07-2010 Through 30-07-2010",

}

Resnick, PJ, Holland, CE, Schwoebel, PR, Hertz, KL & Chichester, DL 2010, 7.1: A microsystems enabled field desorption source. in 23rd International Vacuum Nanoelectronics Conference, IVNC 2010., 5563205, 23rd International Vacuum Nanoelectronics Conference, IVNC 2010, pp. 104-105, 23rd International Vacuum Nanoelectronics Conference, IVNC 2010, Palo Alto, CA, United States, 07/26/10. https://doi.org/10.1109/IVNC.2010.5563205

7.1: A microsystems enabled field desorption source. / Resnick, Paul J.; Holland, Christopher E.; Schwoebel, Paul R. et al.
23rd International Vacuum Nanoelectronics Conference, IVNC 2010. 2010. p. 104-105 5563205 (23rd International Vacuum Nanoelectronics Conference, IVNC 2010).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - 7.1

T2 - 23rd International Vacuum Nanoelectronics Conference, IVNC 2010

AU - Resnick, Paul J.

AU - Holland, Christopher E.

AU - Schwoebel, Paul R.

AU - Hertz, Kristin L.

AU - Chichester, David L.

PY - 2010

Y1 - 2010

N2 - Technologies that have been developed for microelectromechanical systems (MEMS) have been applied to the fabrication of field desorption arrays. These techniques include the use of thick films for enhanced dielectric stand-off, as well as an integrated gate electrode. The increased complexity of MEMS fabrication provides enhanced design flexibility over traditional methods.

AB - Technologies that have been developed for microelectromechanical systems (MEMS) have been applied to the fabrication of field desorption arrays. These techniques include the use of thick films for enhanced dielectric stand-off, as well as an integrated gate electrode. The increased complexity of MEMS fabrication provides enhanced design flexibility over traditional methods.

KW - Arrays

KW - Field desorption

KW - MEMS

KW - Silicon tips

UR - https://www.scopus.com/pages/publications/77958487688

U2 - 10.1109/IVNC.2010.5563205

DO - 10.1109/IVNC.2010.5563205

M3 - Conference contribution

AN - SCOPUS:77958487688

SN - 9781424478873

T3 - 23rd International Vacuum Nanoelectronics Conference, IVNC 2010

SP - 104

EP - 105

BT - 23rd International Vacuum Nanoelectronics Conference, IVNC 2010

Y2 - 26 July 2010 through 30 July 2010

ER -

7.1: A microsystems enabled field desorption source

Abstract

Publication series

Conference

Keywords

Access to Document

Other files and links

Fingerprint

Cite this